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Low temperature resistivity for linewidths from calculated from line resistance and areas determined from SEM cross sections.
Electron channeling contrast image (ECCI) typical of the narrow Cu lines investigated.
Resistivity vs linewidth at with analytical model fit parameters: , , , , and grain size equal to linewidth.
Resistivity vs linewidth at . (a) Analytical model fit parameters: , , , , and grain size equal to the linewidth. (b) Analytical model fit parameters: , , , , and grain size equal to the linewidth and an uncertainty in grain size of for lines narrower than .
Relative electron scattering contribution from interface, grains, impurities, and bulk at 20 and for selected linewidths of 75, 250, and .
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