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- and -penetration profiles at temperatures as given. The resolution function of the sputtering technique is shown for comparison (open symbols). The profiles are shifted on the scale for better comparison. Data affected by surface holdup and sputtering artifacts are omitted for the sake of clarity.
Comparison of measured and tracer diffusivities in with diffusivities calculated from the Stokes-Einstein equation [Eq. (1)]) by using the atomic radius of Co (see text). The dashed lines indicate melting temperature , critical temperature of mode coupling theory , and caloric glass transition temperature (measured at heating rate). Data below might be affected by incomplete structural relaxation.
- and -diffusion data in . Annealing temperature, time, and diffusivities are given.
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