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(Color online) Band-gap blueshift vs Ar plasma exposure time for samples being exposed and annealed. The level of thermal shift is obtained from an annealed-only sample.
(Color online) XPS spectra measured from the InP cap layer for (i) as-grown sample and samples exposed to Ar plasma for (ii) and (iii) . The counts from In and P core levels for the three samples are labeled as well.
(Color online) Band-gap blueshift vs rf power under (i) ICP power, (ii) ICP power, and (iii) ICP power. The plasma exposure time was fixed at .
(Color online) PL spectra measured at from (i) an as-grown sample, (ii) a sample exposed to argon plasma and annealed with a -thick layer ( layer was removed before PL measurement), and bare samples exposed to argon plasma, chemically wet etched in (1:2) solution for (iii) , (iv) , (v) , and (vi) , and finally annealed.
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