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Ohmic contacts to plasma etched
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10.1063/1.2357867
/content/aip/journal/apl/89/13/10.1063/1.2357867
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/13/10.1063/1.2357867

Figures

Image of FIG. 1.
FIG. 1.

Effect of etching on and ratios of the surface of by XPS.

Image of FIG. 2.
FIG. 2.

CL scans of as a function of increasing etch bias.

Tables

Generic image for table
Table I.

Metallizations studied to cumulatively annealed .

Generic image for table
Table II.

Specific contact resistance of directly annealed samples for (a) as-prepared and (b) etched .

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/content/aip/journal/apl/89/13/10.1063/1.2357867
2006-09-28
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ohmic contacts to plasma etched n-Al0.58Ga0.42N
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/13/10.1063/1.2357867
10.1063/1.2357867
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