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In situ reaction mechanism studies of plasma-assisted atomic layer deposition of
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10.1063/1.2357886
/content/aip/journal/apl/89/13/10.1063/1.2357886
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/13/10.1063/1.2357886
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Apparent mass change as determined from the QCM signal for (a) an ALD cycle including dosing and plasma exposure and (b) only plasma exposure.

Image of FIG. 2.
FIG. 2.

(Color online) Time-resolved mass spectrometry signals for several ALD cycles. The most likely parent molecules contributing to the signals at the selected mass-to-charge ratios are indicated.

Image of FIG. 3.
FIG. 3.

(Color online) (a) Emission from a pure plasma and an plasma ignited after a preceding dose as recorded in the first after the plasma strike. (b) Time-resolved signal of selected emission lines during the plasma step after a preceding dose.

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/content/aip/journal/apl/89/13/10.1063/1.2357886
2006-09-28
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/13/10.1063/1.2357886
10.1063/1.2357886
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