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Arbitrary surface structuring of amorphous silicon films based on femtosecond-laser-induced crystallization
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10.1063/1.2358922
/content/aip/journal/apl/89/15/10.1063/1.2358922
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/15/10.1063/1.2358922
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Figures

Image of FIG. 1.
FIG. 1.

(a) Generic mask (CGH) for a 2D pattern (the logo q-Psi) and (b) the optical micrograph of the 2D pattern produced in an film by the FT of a CGH. (c) The micro-Raman spectra for the laser-modified and the uxexposed regions in the 2D pattern. Here, q-Psi is the logo of the Quantum Photonic Science Research Center. In the inset image of (c), the is inverted due to the optical layout of the confocal system; the small white circle represents the region in which the micro-Raman measurements were performed. Among the nine dots in the inset, the excitation laser is focused on the center dot. Pulse ; laser shot .

Image of FIG. 2.
FIG. 2.

(a) Plan-view SEM image for the logo (q-Psi) produced in the film by the FT of the CGH, (b) the indexed polycrystalline ED pattern from the bright region, and (c) an amorphous ED pattern from the dark region.

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/content/aip/journal/apl/89/15/10.1063/1.2358922
2006-10-11
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Arbitrary surface structuring of amorphous silicon films based on femtosecond-laser-induced crystallization
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/15/10.1063/1.2358922
10.1063/1.2358922
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