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Enhanced compositional sensitivity in atomic force microscopy by the excitation of the first two flexural modes
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10.1063/1.2360894
/content/aip/journal/apl/89/15/10.1063/1.2360894
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/15/10.1063/1.2360894

Figures

Image of FIG. 1.
FIG. 1.

Schematics of an amplitude modulation AFM operated under bimodal excitation. The cantilever is mechanically excited at its first two resonances. The photodiode signal (output) is processed to separate its components , , , and .

Image of FIG. 2.
FIG. 2.

Topography and phase images of several T6 islands on silicon: (a) topography, (b) first mode phase shift, and (c) second mode phase shift. (d) Height variation across the dashed lines shown in (a). (e) Phase shift variations across the dashed line shown in (b) and (c). The vertical discontinuous lines show the edges of the T6 island. The contrast observed between silicon and T6 with the phase shift of the first mode is barely above the noise level. T6 and silicon are clearly distinguished by plotting the phase shift of the second mode. and ; and ; .

Image of FIG. 3.
FIG. 3.

(a) AM-AFM topography of a cluster of conjugated molecules (TTF). (b) First and second mode phase shifts across the dashed line shown in (a). and ; and ; .

Tables

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Table I.

Theory and experiment comparison for first and second mode phase shift cross sections obtained on T6 monolayers deposited on silicon.

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/content/aip/journal/apl/89/15/10.1063/1.2360894
2006-10-11
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Enhanced compositional sensitivity in atomic force microscopy by the excitation of the first two flexural modes
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/15/10.1063/1.2360894
10.1063/1.2360894
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