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(Color online) AFM nanolithography to construct (LBMO) nanochannel structures. (a) Schematic illustration of AFM lithography. LBMO microchannel with Pt electrodes was prepared by Ar ion etching and sputtering prior to AFM nanolithography. (b) Optical microscope image of LBMO microchannel with Pt electrodes. (c) AFM image of patterned area, corresponding to boxed area in (b) after the AFM tip was scanned with an applied voltage of . (d) AFM image of patterned area following HCl etching. (e) Detailed AFM image ) of LBMO nanochannel magnified in the boxed area in (d). (f) Cross-sectional profile of (e).
(Color online) Dependence of (a) resistivity and (b) magnetoresistance (MR) ratio of the (LBMO) channel structures with various channel widths (, , and , respectively) on temperature.
(Color online) Dependence of (a) the metal-insulator transition temperature (: closed circle) and the temperature of the inflection point in the resistivity vs temperature (, defined as : open triangles), (b) MR ratio, and (c) polaron activation energy , on channel width. Inset of (c) shows the typical fitting curve for the curve of the LBMO nanochannel structure with a width of based on Eq. (1).
(Color online) AFM image of LBMO nanogap electrode (gap width: ).
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