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Quantum chemical study of the initial surface reactions of atomic layer deposition on the hydroxylated surface
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10.1063/1.2370425
/content/aip/journal/apl/89/16/10.1063/1.2370425
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/16/10.1063/1.2370425
/content/aip/journal/apl/89/16/10.1063/1.2370425
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/content/aip/journal/apl/89/16/10.1063/1.2370425
2006-10-18
2014-10-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Quantum chemical study of the initial surface reactions of HfO2 atomic layer deposition on the hydroxylated GaAs(001)-4×2 surface
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/16/10.1063/1.2370425
10.1063/1.2370425
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