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Electrically detected magnetic resonance in ion-implanted Si:P nanostructures
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10.1063/1.2358928
/content/aip/journal/apl/89/18/10.1063/1.2358928
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/18/10.1063/1.2358928
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic view of the device showing the Ohmic indiffusion (III), the implanted metallic leads (IV), and the cluster implant location (V). The other features are the substrate (I), the thin oxide (II), and the contacts (VI). (b) scanning electron microscopy (SEM) image of the implanted leads before RTA and (c) SEM image of the cluster region.

Image of FIG. 2.
FIG. 2.

(Color online) EDMR signal vs magnetic field for (a) a type 1 sample with and (b) a type 2 and (c) a type 3 device both with . The red lines are fits to the experiment. The blue lines in (a) show the constituent lines of the fit. The constituent line at completely coincides with the full fit, and is therefore not visible.

Image of FIG. 3.
FIG. 3.

Scaling of the EDMR signal intensity with varying structure size for a series of devices of all three types investigated. The lines are guides for the eyes.

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/content/aip/journal/apl/89/18/10.1063/1.2358928
2006-11-02
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrically detected magnetic resonance in ion-implanted Si:P nanostructures
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/18/10.1063/1.2358928
10.1063/1.2358928
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