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Low-temperature solid-phase crystallization of amorphous silicon thin films deposited by rf magnetron sputtering with substrate bias
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10.1063/1.2219136
/content/aip/journal/apl/89/2/10.1063/1.2219136
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/2/10.1063/1.2219136
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) XRD spectra of annealed Si films deposited by unbiased sputter deposition and (b) XRD spectra of annealed Si films deposited by biased sputter deposition.

Image of FIG. 2.
FIG. 2.

UV reflectance spectra of annealed Si films deposited by unbiased and biased sputter deposition.

Image of FIG. 3.
FIG. 3.

(a) Raman spectra of annealed Si films deposited by unbiased and biased sputter deposition (annealed at for and (b) Raman spectra of annealed Si films deposited by unbiased and biased sputter deposition (annealed at for ).

Image of FIG. 4.
FIG. 4.

Surface morphology of annealed Si films taken by SEM and AFM.

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/content/aip/journal/apl/89/2/10.1063/1.2219136
2006-07-10
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Low-temperature solid-phase crystallization of amorphous silicon thin films deposited by rf magnetron sputtering with substrate bias
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/2/10.1063/1.2219136
10.1063/1.2219136
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