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Low-temperature solid-phase crystallization of amorphous silicon thin films deposited by rf magnetron sputtering with substrate bias
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10.1063/1.2219136
/content/aip/journal/apl/89/2/10.1063/1.2219136
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/2/10.1063/1.2219136
/content/aip/journal/apl/89/2/10.1063/1.2219136
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/content/aip/journal/apl/89/2/10.1063/1.2219136
2006-07-10
2014-09-03
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Low-temperature solid-phase crystallization of amorphous silicon thin films deposited by rf magnetron sputtering with substrate bias
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/2/10.1063/1.2219136
10.1063/1.2219136
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