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Intense photoluminescence from amorphous tantalum oxide films
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10.1063/1.2219991
/content/aip/journal/apl/89/2/10.1063/1.2219991
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/2/10.1063/1.2219991
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Figures

Image of FIG. 1.
FIG. 1.

(a) A plan-view SEM image, (b) a cross-section TEM image, and (c) a HRTEM image of a tantalum oxide film on silicon substrates. Inset of (c) is a corresponding SAD pattern; (d) a HRTEM image of the interface between the tantalum oxide film and the silicon substrate.

Image of FIG. 2.
FIG. 2.

(a) An XPS spectrum of the peaks of the as-deposited film at a depth of ; (b) XRD patterns of the film annealed at various temperatures.

Image of FIG. 3.
FIG. 3.

(a) The PL spectrum of the as-deposited tantalum oxide film, (b) PL spectra of the films annealed at various temperatures, (c) the intensity of the emissions vs the annealing temperature, and (d) the emission intensity of the film annealed at vs the laser power.

Image of FIG. 4.
FIG. 4.

XPS spectra at a depth of for films annealed at various temperatures. (a) The peak and (b) the peaks.

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/content/aip/journal/apl/89/2/10.1063/1.2219991
2006-07-13
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Intense photoluminescence from amorphous tantalum oxide films
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/2/10.1063/1.2219991
10.1063/1.2219991
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