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(a) A plan-view SEM image, (b) a cross-section TEM image, and (c) a HRTEM image of a tantalum oxide film on silicon substrates. Inset of (c) is a corresponding SAD pattern; (d) a HRTEM image of the interface between the tantalum oxide film and the silicon substrate.
(a) An XPS spectrum of the peaks of the as-deposited film at a depth of ; (b) XRD patterns of the film annealed at various temperatures.
(a) The PL spectrum of the as-deposited tantalum oxide film, (b) PL spectra of the films annealed at various temperatures, (c) the intensity of the emissions vs the annealing temperature, and (d) the emission intensity of the film annealed at vs the laser power.
XPS spectra at a depth of for films annealed at various temperatures. (a) The peak and (b) the peaks.
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