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Bragg-Brentano diffraction pattern of contacts with Ti annealed at 650 and (a) and Ti annealed at 650 and (b). The phase formed during annealing and the multiple substrate contributions are indicated. Using a thinner Ti layer, a transition from toward and Al–Au–Ti phases is promoted.
Cross section TEM micrographs of contacts with Ti annealed at (a) and Ti annealed at (b).
Current maps determined by C-AFM measurements of the sample with Ti annealed at (a) and Ti annealed at (b). The Ti sample has a larger conductive fraction of the contact area with respect to the Ti sample.
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