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Enhanced tunability of magnetron sputtered thin films on -plane sapphire substrates
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10.1063/1.2220530
/content/aip/journal/apl/89/2/10.1063/1.2220530
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/2/10.1063/1.2220530
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) BST film growth rate and ratio and (b) ratio and oxygen incorporation as a function of total process gas pressure .

Image of FIG. 2.
FIG. 2.

Measured and fitted XPS spectra for Ba energy level, as a function of process gas pressure , for substrate temperature. The XPS spectrum for the sputtering target material is also shown.

Image of FIG. 3.
FIG. 3.

XRD patterns of BST thin films deposited at with substrate temperature (a) and (b)–(e) . Film thickness is also indicated. The sample shown at (d) was preannealed at in 1:9 inside the deposition chamber for prior to sputtering the film. After a postdeposition anneal of sample (d) in air at , the XRD pattern (e) was obtained.

Image of FIG. 4.
FIG. 4.

Extracted capacitance and factor from at 0 and bias for gap interdigital capacitor.

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/content/aip/journal/apl/89/2/10.1063/1.2220530
2006-07-10
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Enhanced tunability of magnetron sputtered Ba0.5Sr0.5TiO3 thin films on c-plane sapphire substrates
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/2/10.1063/1.2220530
10.1063/1.2220530
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