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Steps in SIMOX 3D sculpting (cross sectional view). (a) Oxygen-ion implantation into SOI through a mask. (b) High-temperature annealing.
Comparison of ion-implantation step: (a) SIMOX process for SOI substrate fabrication and (b) SIMOX 3D sculpting process for EPIC substrate fabrication.
(a) TEM and (b) TED photographs of fabricated substrate to investigate the effect of BOX layer.
TEM photographs of optical waveguide at semitransparent mask thicknesses of (a) , (b) , and (c) .
Secco etching defect mapping of the first silicon layer of electric and photonic double-layer substrate fabricated by SIMOX 3D sculpting at the semitransparent mask thicknesses of (a) , (b) , and (c) . In the photograph arrows indicate the etching pit formed by Secco etching solution.
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