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Analysis of defects in an electric and photonic double-layer substrate made by separation-by-implanted-oxygen three-dimensional sculpting
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10.1063/1.2388882
/content/aip/journal/apl/89/20/10.1063/1.2388882
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/20/10.1063/1.2388882
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Steps in SIMOX 3D sculpting (cross sectional view). (a) Oxygen-ion implantation into SOI through a mask. (b) High-temperature annealing.

Image of FIG. 2.
FIG. 2.

Comparison of ion-implantation step: (a) SIMOX process for SOI substrate fabrication and (b) SIMOX 3D sculpting process for EPIC substrate fabrication.

Image of FIG. 3.
FIG. 3.

(a) TEM and (b) TED photographs of fabricated substrate to investigate the effect of BOX layer.

Image of FIG. 4.
FIG. 4.

TEM photographs of optical waveguide at semitransparent mask thicknesses of (a) , (b) , and (c) .

Image of FIG. 5.
FIG. 5.

Secco etching defect mapping of the first silicon layer of electric and photonic double-layer substrate fabricated by SIMOX 3D sculpting at the semitransparent mask thicknesses of (a) , (b) , and (c) . In the photograph arrows indicate the etching pit formed by Secco etching solution.

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/content/aip/journal/apl/89/20/10.1063/1.2388882
2006-11-16
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Analysis of defects in an electric and photonic double-layer substrate made by separation-by-implanted-oxygen three-dimensional sculpting
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/20/10.1063/1.2388882
10.1063/1.2388882
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