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Generation of argon-ion mixed silicon plasmas forming argon encapsulated silicon clusters
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10.1063/1.2404606
/content/aip/journal/apl/89/24/10.1063/1.2404606
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/24/10.1063/1.2404606
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematic diagram of experimental setup.

Image of FIG. 2.
FIG. 2.

Electron density (closed circles) and electron temperature (open triangles) as functions of (a) electron beam current without Ar plasma for , , and (b) rf power for , .

Image of FIG. 3.
FIG. 3.

(Color online) LD-TOF mass spectra of the Si clusters deposited on the substrate, which are produced by (a) the pure Si plasma for , , and (b) Si–Ar plasma for , , . Deposition time is . The inset shows the magnification of the mass spectra in the range of .

Image of FIG. 4.
FIG. 4.

XPS spectra of the Si clusters deposited on the substrate, which are produced by (a) the pure Si plasma for , , and (b) Si–Ar plasma for , , . Deposition time is .

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/content/aip/journal/apl/89/24/10.1063/1.2404606
2006-12-14
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Generation of argon-ion mixed silicon plasmas forming argon encapsulated silicon clusters
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/24/10.1063/1.2404606
10.1063/1.2404606
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