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XPS depth profiling of O and Ca in thin films of Ca on organic layers /glass and Ca on Si substrates with the Ar ion sputtering time: (a) O on BCP, (b) Ca on BCP, (c) O on , (d) Ca on (e) O in Ca , and (f) Ca in Ca .
Spectra of (a) refractive index and (b) extinction coefficient (solid symbols) and skin depth (open symbols) of Ca bilayer structure on Si substrate and Ag reference layer as a function of wavelength.
Current density and brightness variation as a function of voltage in the Ni electrophosphorescent top emission device. The inset shows the electrophosphorescence spectrum of the same device.
Electrophoshorescent efficiency and brightness as a function of current density in the Ni electrophosphorescent top emission device.
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