1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Fabrication of half-pitch resist patterns using near-field lithography with mask
Rent:
Rent this article for
USD
10.1063/1.2227633
/content/aip/journal/apl/89/3/10.1063/1.2227633
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/3/10.1063/1.2227633
/content/aip/journal/apl/89/3/10.1063/1.2227633
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/89/3/10.1063/1.2227633
2006-07-19
2014-08-31
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of half-pitch 32nm resist patterns using near-field lithography with a-Si mask
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/3/10.1063/1.2227633
10.1063/1.2227633
SEARCH_EXPAND_ITEM