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EWF of metals when used as single layer (grey) and as capping layer (black) of thick ALD-TaN film.
Normalized curves of stack and stack representing flatband voltage shift to the positive bias. Corresponding -EOT plots are shown in the inset.
EELS data of poly- sample. A significant interdiffusion of Ti and Ta can be observed.
EWF variation as a function of PVD-Ti film thickness on 5 and thick ALD-TaN films.
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