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HRTEM images of the gate stack (a) as deposited and (b) after RTA. Note the thickness reduction of the -like layer at the Si interface in (b). In addition to thinning, silicide reaction was observed (see Fig. 2).
(Color online) Interface reaction observed for the gate stack after the RTA. (a) HRTEM image showing thinning (arrows) near the reaction phase at the Si interface. (b) HAADF image showing Hf-rich silicide reaction phase protruding into the Si substrate. The inset shows the crystalline silicide.
(Color online) HRTEM images of (a) the stack after RTA at and (b) the stack after RTA at , showing no thinning and a stable interface with the Si substrate.
(Color online) Al -edge EELS of the AlN layer after the RTA.
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