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Growth of nanorods in reactive sputtering
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10.1063/1.2269180
/content/aip/journal/apl/89/6/10.1063/1.2269180
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/6/10.1063/1.2269180
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

XPS analysis of deposited with reactive sputtering under the oxygen-to-argon flow ratios of (a) and (b) .

Image of FIG. 2.
FIG. 2.

Morphology of deposited with reactive sputtering at the substrate temperatures of (a) 200, (b) 300, and (c) .

Image of FIG. 3.
FIG. 3.

Lattice images around the growth tip of a nanorod.

Image of FIG. 4.
FIG. 4.

(a) Cross-section views and (b) field-emission characteristics of nanorods grown for 0.5, 2, and at the same flow ratio of and substrate temperature of .

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/content/aip/journal/apl/89/6/10.1063/1.2269180
2006-08-11
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Growth of RuO2 nanorods in reactive sputtering
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/6/10.1063/1.2269180
10.1063/1.2269180
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