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Probing nanoscale local lattice strains in advanced Si complementary metal-oxide-semiconductor devices
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10.1063/1.2336085
/content/aip/journal/apl/89/6/10.1063/1.2336085
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/6/10.1063/1.2336085
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/content/aip/journal/apl/89/6/10.1063/1.2336085
2006-08-09
2014-08-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Probing nanoscale local lattice strains in advanced Si complementary metal-oxide-semiconductor devices
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/6/10.1063/1.2336085
10.1063/1.2336085
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