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Molecular modeling of low- films of carbon-doped silicon oxides for theoretical investigations of the mechanical and dielectric properties
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10.1063/1.2336273
/content/aip/journal/apl/89/6/10.1063/1.2336273
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/6/10.1063/1.2336273
/content/aip/journal/apl/89/6/10.1063/1.2336273
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/content/aip/journal/apl/89/6/10.1063/1.2336273
2006-08-08
2014-10-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Molecular modeling of low-k films of carbon-doped silicon oxides for theoretical investigations of the mechanical and dielectric properties
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/6/10.1063/1.2336273
10.1063/1.2336273
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