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Defect generation at interfaces by low pressure chemical vapor deposition of silicon nitride
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10.1063/1.2345247
/content/aip/journal/apl/89/9/10.1063/1.2345247
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/9/10.1063/1.2345247
/content/aip/journal/apl/89/9/10.1063/1.2345247
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/content/aip/journal/apl/89/9/10.1063/1.2345247
2006-09-01
2015-05-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Defect generation at SiO2∕Si interfaces by low pressure chemical vapor deposition of silicon nitride
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/9/10.1063/1.2345247
10.1063/1.2345247
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