Full text loading...
(a) High frequency capacitance density vs applied voltage. (b) Capacitance density at zero bias vs frequency for MIM capacitors with as deposited and annealed nanolaminate stacks (curves 1 and 3) and HfTiO (curves 2 and 4) films. Curves 1 and 2—as deposited. Curves 3 and 4—annealed in for at .
(a) Current density-voltage characteristics of annealed MIM capacitors with nanolaminate stacks and HfTiO films measured at . (b) Measurement at of current density-voltage characteristic of MIM structure with nanolaminate stacks. The structures were annealed in for at .
Measured at and calculated (solid lines) normalized capacitance of and HfTiO MIM capacitors (annealed in for at ) as a function of applied voltage.
(a) High frequency capacitance characteristics of nanolaminate stacks based on MIM capacitor measured at different temperatures. (b) Capacitance density at zero bias vs temperature of nanolaminate stacks and HfTiO films based on annealed MIM capacitors. Structures were annealed at in for .
Article metrics loading...