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High capacitance density metal-insulator-metal structure based on nanolaminate stacks
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10.1063/1.2425030
/content/aip/journal/apl/90/1/10.1063/1.2425030
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/1/10.1063/1.2425030
/content/aip/journal/apl/90/1/10.1063/1.2425030
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/content/aip/journal/apl/90/1/10.1063/1.2425030
2007-01-04
2014-07-10
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High capacitance density metal-insulator-metal structure based on Al2O3–HfTiO nanolaminate stacks
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/1/10.1063/1.2425030
10.1063/1.2425030
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