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Wafer-level filling of microfabricated atomic vapor cells based on thin-film deposition and photolysis of cesium azide
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10.1063/1.2712501
/content/aip/journal/apl/90/11/10.1063/1.2712501
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/11/10.1063/1.2712501
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) (a) Exploded schematic of a wafer of cells and schematic of a single cell after fabrication and dicing. (b) Batch fabrication and filling process.

Image of FIG. 2.
FIG. 2.

(Color online) (a) Scanning electron micrograph of deposited film. The cross indicates where EDS measurement was done.

Image of FIG. 3.
FIG. 3.

(Color online) (a) Photograph of a cell, viewed through the glass window, showing the cesium produced in situ from azide photodecomposition. Most cells contain less azide than shown in this figure. Here a cell with more unreacted azide is shown for clarity. (b) Cesium optical absorption spectrum obtained from a cell in which a film of was deposited and photodissociated. The buffer gas pressure is estimated from the line broadening to be about at room temperature.

Image of FIG. 4.
FIG. 4.

(Color online) CPT transmission for a -derived cell. The buffer gas pressure in this cell was about .

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/content/aip/journal/apl/90/11/10.1063/1.2712501
2007-03-15
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Wafer-level filling of microfabricated atomic vapor cells based on thin-film deposition and photolysis of cesium azide
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/11/10.1063/1.2712501
10.1063/1.2712501
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