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Effects of plasma immersion ion nitridation on dielectric properties of
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10.1063/1.2715044
/content/aip/journal/apl/90/12/10.1063/1.2715044
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/12/10.1063/1.2715044
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

XPS Hf and Si core-level spectra acquired from the samples with and without nitrogen incorporation. The arrows indicate the two possible shoulder peak positions.

Image of FIG. 2.
FIG. 2.

XPS N core-level spectra obtained from the plasma-nitrided samples before and after RTA.

Image of FIG. 3.
FIG. 3.

High-resolution XTEM micrograph of the plasma-nitrided .

Image of FIG. 4.
FIG. 4.

curves of the samples with and without nitrogen incorporation measured from the MOS capacitors at a frequency of . The inset shows the characteristic.

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/content/aip/journal/apl/90/12/10.1063/1.2715044
2007-03-20
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of plasma immersion ion nitridation on dielectric properties of HfO2
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/12/10.1063/1.2715044
10.1063/1.2715044
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