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Ion beam irradiated channel waveguides in -doped tellurite glass
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View: Figures


Image of FIG. 1.
FIG. 1.

Sketch of the setup used to fabricate channel waveguides in -doped tellurite glasses by ion irradiation. A silicon mask, with an opening of about , is placed in front of the sample before each exposure in order to define a channel waveguide.

Image of FIG. 2.
FIG. 2.

(a) Distribution of oxygen and tellurium vacancies in tungsten tellurite glasses as a function of the target depth using SRIM simulation. (b) Distribution of the implanted ions as a function of the target depth. The ion energy is .

Image of FIG. 3.
FIG. 3.

(a) Channel waveguide near field image at . The 2D confinement of the light demonstrates that there is an increase in the refractive index in the exposed region. Irradiation dose is . (b) Confined green upconversion of ions along the waveguide after pumping. The end-fire coupled input fiber is visible on the right side.

Image of FIG. 4.
FIG. 4.

Profilometer scan of the surface of the tellurite glass in the direction transversal to the channel of Fig. 3. A surface swelling of about is measured around the exposed area due to volume expansion produced by the irradiated ions.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ion beam irradiated channel waveguides in Er3+-doped tellurite glass