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Comparative study of passivation mechanism of oxygen vacancy with fluorine in and
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10.1063/1.2719177
/content/aip/journal/apl/90/14/10.1063/1.2719177
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/14/10.1063/1.2719177
/content/aip/journal/apl/90/14/10.1063/1.2719177
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/content/aip/journal/apl/90/14/10.1063/1.2719177
2007-04-02
2014-10-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparative study of passivation mechanism of oxygen vacancy with fluorine in HfO2 and HfSiO4
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/14/10.1063/1.2719177
10.1063/1.2719177
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