1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Suppressed growth of unstable low- interlayer in Ge metal-oxide-semiconductor capacitor with high- gate dielectric by annealing in water vapor
Rent:
Rent this article for
USD
10.1063/1.2723074
/content/aip/journal/apl/90/16/10.1063/1.2723074
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/16/10.1063/1.2723074
/content/aip/journal/apl/90/16/10.1063/1.2723074
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/90/16/10.1063/1.2723074
2007-04-16
2014-08-28
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Suppressed growth of unstable low-kGeOx interlayer in Ge metal-oxide-semiconductor capacitor with high-k gate dielectric by annealing in water vapor
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/16/10.1063/1.2723074
10.1063/1.2723074
SEARCH_EXPAND_ITEM