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Impact of interfacial layer control using in gate dielectric on GaAs
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10.1063/1.2732821
/content/aip/journal/apl/90/18/10.1063/1.2732821
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/18/10.1063/1.2732821
/content/aip/journal/apl/90/18/10.1063/1.2732821
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/content/aip/journal/apl/90/18/10.1063/1.2732821
2007-05-02
2014-10-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Impact of interfacial layer control using Gd2O3 in HfO2 gate dielectric on GaAs
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/18/10.1063/1.2732821
10.1063/1.2732821
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