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(Color online) Schematic diagram for fabricating Si nanopillar array on Si using a self-assembled Ni nanodot etching mask on substrate is illustrated. The scanning electron microscopic (SEM) photographs of unprocessed Si substrate, self-aggregated Ni on , and ICP-RIE etched Si nanopillars on Si are shown for example.
SEM photographs of Si nanopillar array obtained by detuning the ICP power at (a) 50, (b) 100, (c) 150, and (d) .
(Color online) Surface reflectance and corresponding refractive indices of unprocessed bulk Si and Si nanopillar array on Si substrate.
(Color online) Angular dependent reflectance of Si nanopillar array and bulk Si substrate (inset) measured by HeNe laser at and different polarizations.
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