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Extreme ultraviolet holographic lithography: Initial results
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/content/aip/journal/apl/90/2/10.1063/1.2430774
2007-01-12
2014-12-21

Abstract

The authors report the initial results from a holographiclithography technique using extreme ultraviolet(EUV)radiation. This approach removes the need for complex EUV reflective masks and optics, replacing them with a binary, nanopatterned transmission mask. Computer generated holograms were fabricated on thick silicon nitride membranes with a thick chromium absorber layer. Reconstructed images have been recorded in an thick polymethylmetacrylate photoresist using wavelength EUVradiation from an undulator source. The pattern was characterized by optical and atomic force microscopies, and compared with simulation results from the TOOLSET diffraction simulation program, yielding excellent agreement.

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Scitation: Extreme ultraviolet holographic lithography: Initial results
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/2/10.1063/1.2430774
10.1063/1.2430774
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