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Nanoimprint mold fabrication and replication by room-temperature conformal chemical vapor deposition
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10.1063/1.2741122
/content/aip/journal/apl/90/20/10.1063/1.2741122
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/20/10.1063/1.2741122
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematic of the imprint mold replication process: (a) A master mold is used to pattern thermoplastic imprint resist by thermal NIL. (b) A thin film of is deposited onto the resist by room-temperature conformal PECVD. (c) The layer is bonded to a quartz substrate by UV-cure adhesive. (d) The layer is separated from the imprint resist leaving (e) the completed mold replica on the quartz substrate.

Image of FIG. 2.
FIG. 2.

Cross-sectional SEM images of the imprint mold replication process: (a) pitch gratings in imprint resist after imprint with master mold. (b) Resist gratings with thin film of after room-temperature conformal PECVD. (c) Completed mold replica after bonding and transfer of layer to quartz substrate. (d) pitch gratings in thermoplastic resist after imprint with mold replica.

Image of FIG. 3.
FIG. 3.

SEM images demonstrating faithful replication of mold features. (a) pitch gratings with features (as noted) in thermoplastic imprint resist after imprint with original master mold. (b) Completed mold replica after bonding and transfer of layer to a second substrate. As indicated, features from the original mold are replicated in the replica mold.

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/content/aip/journal/apl/90/20/10.1063/1.2741122
2007-05-18
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nanoimprint mold fabrication and replication by room-temperature conformal chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/20/10.1063/1.2741122
10.1063/1.2741122
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