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Antiadhesion considerations for UV nanoimprint lithography
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10.1063/1.2740578
/content/aip/journal/apl/90/21/10.1063/1.2740578
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/21/10.1063/1.2740578

Figures

Image of FIG. 1.
FIG. 1.

Adhesion energy measurements for mPSS-IBMA resist with fluorosilane and DLC release coatings. The large data scatter at small crack lengths may result from the presence of oxygen, known to participate in free radical reactions (see Ref. 22), at the edges of the specimens during cure.

Tables

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Table I.

Chemical compositions of mPSS-IBMA resist and F-SAM fluorosilane-treated quartz surfaces by XPS (at. %) (deviation, multiple measurements).

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Table II.

Chemical compositions of mPSS-IBMA resist and DLC-treated quartz surfaces by XPS (at. %) (deviation, multiple measurements).

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/content/aip/journal/apl/90/21/10.1063/1.2740578
2007-05-21
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Antiadhesion considerations for UV nanoimprint lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/21/10.1063/1.2740578
10.1063/1.2740578
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