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(a) Cross-section scanning electron microscopy image of ZnO nanowire arrays on FTO. (b) HRTEM image of an individual ZnO NW and its corresponding SAED pattern (inset).
(Color online) characteristics of the N3/ and mercurochrome/ZnO-NW DSSCs under AM1.5 illumination.
(Color online) Nyquist plots of the impedance data of the N3/ and mercurochrome/ZnO-NW DSSCs. The solid lines are the fitting results based on the equivalent circuit model shown in the inset, where is the chemical capacitance, is a lumped series resistance for the transport resistance of FTO and all resistances out of the cell, is the impedance of diffusion of redox species in the electrolyte, and and are the charge-transfer resistance and the interfacial capacitance at the counter electrode/electrolyte interface, respectively.
(Color online) Response time determined by OCVD in the mercurochrome/ and N3/ZnO-NW DSSCs as a function of .
Performances of the mercurochrome/ and N3/ZnO-NW DSSCs and the electron transport properties in their photoanodes determined by impedance analysis. The cell areas are .
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