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Cross sectional HR-TEM images of (a) PVD Co film grown at and (b) PE-ALD Co.
XPS spectrum of PE-ALD Co for silicon core-level region after selective etching of Co film.
XRD spectra of PE-ALD after RTA at various annealing temperatures.
Cross sectional HR-TEM images of PE-ALD Co film annealed at .
XRD scan of PE-ALD annealed at . The capping layer and remaining Co film were selectively etched before analysis.
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