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AES depth profiles of (a) 20- and (b) films on a Si substrate using DPALD processes at a deposition temperature of using a precursor and oxygen plasma.
Cross-sectional HRTEM images of as-deposited (a) 30-, (b) 35-, and (c) films on a Si substrate using the DPALD method.
HRTEM images for as-deposited (a) 20- and (b) DPALD thin films and their MEIS results: (c) open circles and open triangles represent raw data and solid lines represent fitted data. (d) The calculated relative concentration in the depth direction of the films from the fitting results.
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