1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Thermodynamic properties and interfacial layer characteristics of thin films deposited by plasma-enhanced atomic layer deposition
Rent:
Rent this article for
USD
10.1063/1.2743749
/content/aip/journal/apl/90/22/10.1063/1.2743749
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/22/10.1063/1.2743749
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

AES depth profiles of (a) 20- and (b) films on a Si substrate using DPALD processes at a deposition temperature of using a precursor and oxygen plasma.

Image of FIG. 2.
FIG. 2.

Cross-sectional HRTEM images of as-deposited (a) 30-, (b) 35-, and (c) films on a Si substrate using the DPALD method.

Image of FIG. 3.
FIG. 3.

HRTEM images for as-deposited (a) 20- and (b) DPALD thin films and their MEIS results: (c) open circles and open triangles represent raw data and solid lines represent fitted data. (d) The calculated relative concentration in the depth direction of the films from the fitting results.

Loading

Article metrics loading...

/content/aip/journal/apl/90/22/10.1063/1.2743749
2007-05-29
2014-04-24
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/22/10.1063/1.2743749
10.1063/1.2743749
SEARCH_EXPAND_ITEM