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Characterization of pattern transfer in the fabrication of magnetic nanostructure arrays by block copolymer lithography
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10.1063/1.2743900
/content/aip/journal/apl/90/23/10.1063/1.2743900
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/23/10.1063/1.2743900
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Figures

Image of FIG. 1.
FIG. 1.

[(a)–(c)] Tapping mode AFM images and [(d)–(f)] schematics of the fabrication process. (a) and (d) are after spinning and annealing the PS-PI-PLA thin film on the film. (b) and (e) are after aqueous degradation of the PLA and reactive ion etching. (c) and (f) are after Ar ion milling and polymer template dissolution.

Image of FIG. 2.
FIG. 2.

Ar ion beam milling time dependence of (a) the measured saturation magnetic moment normalized to the value, (b) the coercivity, (c) the resistivity at 300 and , (d) the residual resistivity ratio, and (e) the anisotropic magnetoresistance at 300 and . The vertical dotted lines delineate the three regimes shown in Fig. 3 .

Image of FIG. 3.
FIG. 3.

Temperature dependence of the coercivity for Ar ion beam milling times of (a) 0 and , (b) 2.5 and , and (c) . The schematic insets illustrate these three regimes. The vertical arrow in (c) marks the superparamagnetic blocking temperature.

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/content/aip/journal/apl/90/23/10.1063/1.2743900
2007-06-07
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Characterization of pattern transfer in the fabrication of magnetic nanostructure arrays by block copolymer lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/23/10.1063/1.2743900
10.1063/1.2743900
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