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Real time structural modification of epitaxial FePt thin films under x-ray rapid thermal annealing using undulator radiation
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10.1063/1.2749426
/content/aip/journal/apl/90/25/10.1063/1.2749426
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/25/10.1063/1.2749426
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Figures

Image of FIG. 1.
FIG. 1.

Theoretical spectral power of the white (dashed trace) and pink (solid trace) beams up to a photon energy of . The integrated power delivered by the pink beam is compared to delivered by the white beam. The inset shows a specular XRD scan of a Si (111) reflection from the analyzer crystal. The undulator fundamental energy was set at .

Image of FIG. 2.
FIG. 2.

Specular XRD scans of the superstructure (001) and fundamental (002) reflections of an epitaxial FePt thin film. (a) RT scan of the as-grown film and (b) scan of the same film during XRTA. The noticeable splitting of the fundamental reflections during annealing is clear evidence of changes in the microstructure. The presence of superstructure peaks reflects some degree of chemical order. The data (solid lines) are fit to peaks corresponding to the and phases (dashed and dotted lines, respectively).

Image of FIG. 3.
FIG. 3.

High resolution (HRTEM) image of an as-grown epitaxial FePt thin film where a chemically ordered grain near the film/MgO buffer layer interface can be observed. The average size of ordered regions determined from XRD scans is consistent with the dimension of the ordered region in this image. The top inset shows the FFT of this ordered grain, while the low inset shows the FFT of a disordered region. Thus, we notice the doubled periodicity in two orthogonal directions of the ordered region with respect to the disordered one.

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/content/aip/journal/apl/90/25/10.1063/1.2749426
2007-06-18
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Real time structural modification of epitaxial FePt thin films under x-ray rapid thermal annealing using undulator radiation
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/25/10.1063/1.2749426
10.1063/1.2749426
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