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(Color online) STM images of a low coverage of Si deposited at RT on a Ag(110) surface. (a) Before annealing; (filled states), . (b) After annealing at . , .
(Color online) (a) STM image below full “monolayer” coverage of the Ag(110) surface; (filled states), . (b) Height profile along the transverse line in (a). (c) Lowest energy atomic model of individual Si NWs devised by He (Ref. 3).
(Color online) (a) Auger intensity signals of Si and as a function of time during the deposition of Si on Ag(110) at . The dotted line indicates the deposition time where the entire surface is covered by the Si nanowire array . (b) LEED pattern taken at primary energy.
(Color online) STM image of the surface at full coverage ; (filled states), .
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