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Formation of a one-dimensional grating at the molecular scale by self-assembly of straight silicon nanowires
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10.1063/1.2752125
/content/aip/journal/apl/90/26/10.1063/1.2752125
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/26/10.1063/1.2752125
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) STM images of a low coverage of Si deposited at RT on a Ag(110) surface. (a) Before annealing; (filled states), . (b) After annealing at . , .

Image of FIG. 2.
FIG. 2.

(Color online) (a) STM image below full “monolayer” coverage of the Ag(110) surface; (filled states), . (b) Height profile along the transverse line in (a). (c) Lowest energy atomic model of individual Si NWs devised by He (Ref. 3).

Image of FIG. 3.
FIG. 3.

(Color online) (a) Auger intensity signals of Si and as a function of time during the deposition of Si on Ag(110) at . The dotted line indicates the deposition time where the entire surface is covered by the Si nanowire array . (b) LEED pattern taken at primary energy.

Image of FIG. 4.
FIG. 4.

(Color online) STM image of the surface at full coverage ; (filled states), .

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/content/aip/journal/apl/90/26/10.1063/1.2752125
2007-06-26
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Formation of a one-dimensional grating at the molecular scale by self-assembly of straight silicon nanowires
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/26/10.1063/1.2752125
10.1063/1.2752125
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