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Epitaxial electrodeposition of freestanding large area single crystal substrates
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10.1063/1.2752531
/content/aip/journal/apl/90/26/10.1063/1.2752531
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/26/10.1063/1.2752531
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematic of electrochemical deposition and etching steps used to form freestanding single crystal films.

Image of FIG. 2.
FIG. 2.

(Color online) Schematic of continuous electrodeposition and etching process to form freestanding single crystal films.

Image of FIG. 3.
FIG. 3.

Characterization of freestanding single crystal nickel samples (, thick) showing quality of material. (a) EBSD pole figures of {001}, {111}, and {110} planes. FWHMs of EBSD pole distribution in (b) normal and (c) in-plane directions are shown.

Image of FIG. 4.
FIG. 4.

(a) X-ray diffraction pattern from scan of thick Ni film. (b) Rocking curve of Ni (002) peak in out-of-plane direction; (c) AFM image of surface of freestanding Ni (001) film; rms .

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/content/aip/journal/apl/90/26/10.1063/1.2752531
2007-06-26
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Epitaxial electrodeposition of freestanding large area single crystal substrates
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/26/10.1063/1.2752531
10.1063/1.2752531
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