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(Color online) Characterization of the thick film deposited at on Si(100) by dual ion beam sputtering. (a) XRD pattern acquired at grazing incidence (i.e., 1°) with respect to the surface plane. (b) RBS experimental (symbols) and simulated (continuos line) spectra acquired at . The scattering energies for N, Si, Fe, Ni, and W are indicated.
(Color online) Magnetic properties of the film. (a) Easy-axis (i.e., ) and hard-axes (i.e., ) in-plane resolved hysteresis loops, as labeled. (b) Angular dependence of the reduced magnetization remanence (symbols) compared with the behavior (line) expected for uniaxial anisotropy systems.
(Color online) XMCD spectra of the film at (a) and (b) absorption edges. The data are normalized to the total absorption and corrected for the incomplete circular polarization and the out-of-grazing incidence of the photons. The integrated XMCD signals used for the sum rule analysis (dashed lines) are also displayed.
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