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Correlation between diamond grain size and hydrogen retention in diamond films studied by scanning electron microscopy and secondary ion mass spectroscopy
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10.1063/1.2432996
/content/aip/journal/apl/90/3/10.1063/1.2432996
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/3/10.1063/1.2432996

Figures

Image of FIG. 1.
FIG. 1.

SEM micrographs of as-deposited diamond films: (a) HF CVD diamond film deposited from gas mixture for (thickness and grain size ), (b) HF CVD diamond film deposited from gas mixture for (thickness and grain size ), and (c) HF CVD diamond film deposited from gas mixture (thickness and grain size ), and (d) cross sectional image of dc GD CVD nanodiamond film deposited from gas mixture for (thickness and grain size ).

Image of FIG. 2.
FIG. 2.

(Color online) SIMS profile of hydrogen (deuterium) within three different types of diamond films. (a) HF CVD film deposited from gas mixture for . Note the decrease of H concentration from at initial growth region (grain size ) to for thicker film (grain size ). (b) HF CVD thick film deposited from gas mixture. The deuterium concentration is , (c) H profile of a thick nanodiamond film deposited by dc GD CVD. The hydrogen concentration increases from at the initial stage of film evolution (predominantly graphitic precursor) up to in the region where sized nanodiamond grains are embedded in an amorphous carbon matrix. The inset shows the hydrogen and deuterium concentration depth profiles of the HF CVD diamond sample grown from gas mixture. The hydrogen/deuterium concentration ratio is .

Tables

Generic image for table
Table I.

Hydrogen concentration vs the crystalline size and the surface to volume atom ratio.

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/content/aip/journal/apl/90/3/10.1063/1.2432996
2007-01-19
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Correlation between diamond grain size and hydrogen retention in diamond films studied by scanning electron microscopy and secondary ion mass spectroscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/3/10.1063/1.2432996
10.1063/1.2432996
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