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Influence of the electron beam on electromigration measurements within a scanning electron microscope
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10.1063/1.2432304
/content/aip/journal/apl/90/4/10.1063/1.2432304
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/4/10.1063/1.2432304
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Experimental layout to study the influence of the electron beam. Image (a) shows the electrical connection to the nanowire; image (b) shows the frame within the wire is scanned. The electron beam during the scanning process is directed along the white arrow. After one line is scanned the beam proceeds along the black arrow to scan the next line. In this way a complete image is obtained in a time interval of, e.g., .

Image of FIG. 2.
FIG. 2.

Resistance versus time during an in situ SEM observation of a polycrystalline gold wire. The overall resistance increase is due to a slow thermalization of the wire with respect to the silicon substrate. The periodic oscillations are due to the influence of the electron beam. The inset reveals the periodicity of the oscillations of .

Image of FIG. 3.
FIG. 3.

Dependence of temperature change of a gold nanowire due to power dissipation by Joule heating.

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/content/aip/journal/apl/90/4/10.1063/1.2432304
2007-01-26
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of the electron beam on electromigration measurements within a scanning electron microscope
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/4/10.1063/1.2432304
10.1063/1.2432304
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