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X-ray diffraction patterns of as deposited and annealed at the temperature shown in figure of (a) (001) for and (b) (001) for .
AES depth profile of (001) for (a) as deposited and (b) annealed at for .
AES depth profile of (001) for (a) as-deposited and (b) annealed at for .
Sheet resistance of Cu vs annealing temperature for Ta(O)N and Ta–Ge–(O)N.
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