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Schematic illustration of experimental setup for evaluating x-ray nanofocusing mirror. The intensity profile on the focal plane is measured by the wire scanning method.
Elliptical profile (a) and figure error profile (b) of the fabricated focusing mirror. A figure accuracy of (rms) was achieved. This surface is produced by EEM.
Relationship between wire position and beam intensity measured by an x-ray photon detector located behind the wire. Plot interval is from .
Intensity distribution profile of focused beam. This profile was obtained by differentiating the curve shown in Fig. 3 using a interval.
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