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Temperature dependence of high- and low-resistance bistable states in polycrystalline NiO films
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10.1063/1.2437668
/content/aip/journal/apl/90/5/10.1063/1.2437668
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/5/10.1063/1.2437668
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Temperature dependence of on and off current-voltage characteristics of -thick structures in a semilogarithmic scale. A compliance value of was used.

Image of FIG. 2.
FIG. 2.

vs curves of the on (solid symbols) and off (open symbols) currents of Fig. 1 at bias voltages of for various compliance currents (triangles: and squares: ). The minus sign of the axis means that the data were measured in reverse bias.

Image of FIG. 3.
FIG. 3.

vs curves of the high-resistance currents before and after forming at . (slope of the solid line) represents the thermal activation energy. The inset represents a magnified plot in the high temperature region.

Image of FIG. 4.
FIG. 4.

vs curves of and whose temperature dependences were obtained separately without switching at each temperature. . The inset shows the temperature dependence of the normalized resistivity, , for and a bulk Ni film.

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/content/aip/journal/apl/90/5/10.1063/1.2437668
2007-01-30
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Temperature dependence of high- and low-resistance bistable states in polycrystalline NiO films
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/5/10.1063/1.2437668
10.1063/1.2437668
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