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Electric-pulse-induced reversible resistance in doped zinc oxide thin films
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10.1063/1.2437688
/content/aip/journal/apl/90/5/10.1063/1.2437688
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/5/10.1063/1.2437688
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Setup used for pulse application and current-voltage characterization.

Image of FIG. 2.
FIG. 2.

Current voltage characteristics of (a) a sulfur doped ZnO sample deposited on substrate (measured under UV illumination) and (b) a cobalt doped ZnO film deposited on . The inset shows the calculated resistance as a function of voltage.

Image of FIG. 3.
FIG. 3.

Resistance response of ZnO films in (a) sulfur doped ZnO film on substrate (measured under UV illumination at ) when an alternate series of voltage pulses of and is applied every , (b) sulfur doped ZnO film on Si substrate (measured in the dark at ) when an alternate series of voltage pulses of and is applied every , and (c) cobalt doped ZnO film deposited by pulsed laser deposition on (measured in the dark at ) when an alternate series of voltage pulses of and is applied every .

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/content/aip/journal/apl/90/5/10.1063/1.2437688
2007-01-30
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electric-pulse-induced reversible resistance in doped zinc oxide thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/5/10.1063/1.2437688
10.1063/1.2437688
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