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Electron-beam-induced formation of Zn nanocrystal islands in a layer
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10.1063/1.2450650
/content/aip/journal/apl/90/5/10.1063/1.2450650
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/5/10.1063/1.2450650
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Cross-sectional bright-field TEM images of (a) as sputter-deposited ZnO layer with in situ created amorphous intermediate layer on Si substrate, (b) after annealing, (c) after electron-beam irradiation for , and (d) after extended electron irradiation for .

Image of FIG. 2.
FIG. 2.

(a) High-resolution TEM image of the electron irradiated structure of Figs. 1(d) and 1(b) corresponding fast-fourier-transformed (FFT) electron-diffraction patterns of Zn nanocrystals, labeled as A and B, respectively in (a).

Image of FIG. 3.
FIG. 3.

Auger electron spectroscopy depth profiles of ZnO films grown on Si substrates: (a) as-grown and (b) annealed at .

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/content/aip/journal/apl/90/5/10.1063/1.2450650
2007-02-01
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electron-beam-induced formation of Zn nanocrystal islands in a SiO2 layer
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/5/10.1063/1.2450650
10.1063/1.2450650
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